Issued Patents 2022
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11532625 | Semiconductor device and method of fabrication thereof | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2022-12-20 |
| 11522074 | Semiconductor device and manufacturing method thereof | Kuan-Lun Cheng, Chih-Hao Wang, Keng-Chu Lin, Shi Ning Ju | 2022-12-06 |
| 11515423 | Semiconductor device having fins | Shu-Hao Kuo, Jung-Hao Chang, Chao-Hsien Huang, Li-Te Lin | 2022-11-29 |
| 11502187 | Semiconductor device structure and method for forming the same | Zhi-Chang Lin, Kuan-Ting Pan, Chih-Hao Wang, Shi Ning Ju | 2022-11-15 |
| 11437513 | Multi-gate device and method of fabrication thereof | Ching-Wei Tsai, Carlos H. Diaz, Chih-Hao Wang, Wai-Yi Lien, Ying-Keung Leung | 2022-09-06 |
| 11424243 | Semiconductor device and manufacturing method thereof | Chih-Hao Wang, Chih-Liang Chen, Shi Ning Ju | 2022-08-23 |
| 11410887 | FinFET device having oxide region between vertical fin structures | Ying-Keung Leung | 2022-08-09 |
| 11393814 | Method for forming semiconductor device with helmet structure between two semiconductor fins | Shi Ning Ju, Chih-Hao Wang | 2022-07-19 |
| 11387237 | Semiconductor component having a fin and an epitaxial contact structure over an epitaxial layer thereof | Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2022-07-12 |
| 11380775 | Gate structure of a semiconductor device and method of making | Ming Zhu, Hui-Wen Lin, Harry-Hak-Lay Chuang, Bao-Ru Young, Yuan-Sheng Huang +4 more | 2022-07-05 |
| 11380591 | Method for manufacturing nanostructure with various widths | Shi Ning Ju, Kuan-Lun Cheng, Chih-Hao Wang | 2022-07-05 |
| 11380682 | Integrated circuits with FinFET gate structures | Huan-Chieh Su, Zhi-Chang Lin, Chih-Hao Wang | 2022-07-05 |
| 11367659 | FinFET channel on oxide structures and related methods | Ching-Wei Tsai, Ying-Keung Leung | 2022-06-21 |
| 11355611 | Multi-gate device and method of fabrication thereof | Ching-Fang Huang, Wen-Hsing Hsieh, Ying-Keung Leung, Chih-Hao Wang, Carlos H. Diaz | 2022-06-07 |
| 11355396 | Method of forming a semiconductor structure including laterally etching semiconductor material in fin recess region and depositing metal gate therein | Zhi-Chang Lin, Shi Ning Ju, Chih-Hao Wang, Kuan-Ting Pan | 2022-06-07 |
| 11349016 | Fin field effect transistor (FinFET) with a liner layer | Kuan-Ting Pan, Shi Ning Ju, Chih-Hao Wang | 2022-05-31 |
| 11302825 | Self-aligned spacers for multi-gate devices and method of fabrication thereof | Shi Ning Ju, Guan-Lin Chen, Kuan-Lun Cheng, Chih-Hao Wang | 2022-04-12 |
| 11289494 | Structure and method for SRAM FinFET device having an oxide feature | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2022-03-29 |
| 11276695 | Multi-gate device and related methods | Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2022-03-15 |
| 11227932 | FinFET devices with a fin top hardmask | Kai-Chieh Yang, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2022-01-18 |