Issued Patents 2022
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11518774 | Method for producing iodine-containing silicon compound | Tsukasa Watanabe | 2022-12-06 |
| 11500292 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Daisuke KORI, Keisuke NIIDA, Takashi SAWAMURA, Seiichiro Tachibana, Takeru Watanabe | 2022-11-15 |
| 11485824 | Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process | Toshiharu Yano, Ryo MITSUI, Kazunori Maeda, Seiichiro Tachibana | 2022-11-01 |
| 11480879 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsukasa Watanabe, Yusuke Biyajima, Masahiro Kanayama | 2022-10-25 |
| 11385544 | Composition for forming silicon-containing resist underlayer film and patterning process | Yusuke Biyajima, Masahiro Kanayama, Tsukasa Watanabe, Masaki Ohashi | 2022-07-12 |
| 11366386 | Patterning process | Tsukasa Watanabe | 2022-06-21 |
| 11307497 | Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Seiichiro Tachibana, Takeru Watanabe, Keisuke NIIDA, Hiroko Nagai, Takashi SAWAMURA | 2022-04-19 |
| 11267937 | Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate | Daisuke KORI, Seiichiro Tachibana, Satoru Kitano, Yukio Abe, Fumihiro Hatakeyama +1 more | 2022-03-08 |
| 11231649 | Patterning process | Tsukasa Watanabe | 2022-01-25 |