Issued Patents 2022
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11506977 | Positive resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-11-22 |
| 11460773 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-10-04 |
| 11460772 | Positive resist composition and patterning process | Jun Hatakeyama | 2022-10-04 |
| 11448962 | Resist composition and patterning process | Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi | 2022-09-20 |
| 11448961 | Iodonium salt, resist composition, and pattern forming process | Takayuki Fujiwara, Kazuhiro Katayama, Kenji Yamada | 2022-09-20 |
| 11435665 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-09-06 |
| 11429023 | Onium salt, negative resist composition, and resist pattern forming process | Daisuke Domon, Naoya Inoue, Keiichi Masunaga, Masaaki Kotake | 2022-08-30 |
| 11415887 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-08-16 |
| 11409194 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-08-09 |
| 11392034 | Resist composition and patterning process | Jun Hatakeyama | 2022-07-19 |
| 11385544 | Composition for forming silicon-containing resist underlayer film and patterning process | Tsutomu Ogihara, Yusuke Biyajima, Masahiro Kanayama, Tsukasa Watanabe | 2022-07-12 |
| 11340527 | Resist composition and patterning process | Teppei Adachi, Shinya Yamashita, Takayuki Fujiwara | 2022-05-24 |
| 11281101 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-03-22 |
| 11269251 | Resist composition and patterning process | Jun Hatakeyama | 2022-03-08 |
| 11269253 | Resist composition and patterning process | Jun Hatakeyama, Takayuki Fujiwara | 2022-03-08 |
| 11262653 | Sulfonium salt, polymer, resist composition, and patterning process | Jun Hatakeyama, Teppei Adachi | 2022-03-01 |
| 11215926 | Sulfonium compound, resist composition, and patterning process | Takayuki Fujiwara, Ryo MITSUI, Ryosuke Taniguchi, Koji Hasegawa | 2022-01-04 |