| 11502242 |
Embedded memory devices |
Ashim Dutta, Chih-Chao Yang, Michael Rizzolo |
2022-11-15 |
| 11462583 |
Embedding magneto-resistive random-access memory devices between metal levels |
Ashim Dutta, Chih-Chao Yang, Daniel C. Edelstein, John C. Arnold |
2022-10-04 |
| 11302630 |
Electrode-via structure |
Chih-Chao Yang, Daniel C. Edelstein |
2022-04-12 |
| 11257717 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Elbert E. Huang, Joe Lee |
2022-02-22 |
| 11244907 |
Metal surface preparation for increased alignment contrast |
Tianji Zhou, Saumya Sharma, Dominik Metzler, Chih-Chao Yang |
2022-02-08 |
| 11239421 |
Embedded BEOL memory device with top electrode pillar |
Dexin Kong, Soon-Cheon Seo, Shyng-Tsong Chen, Youngseok Kim |
2022-02-01 |
| 11239278 |
Bottom conductive structure with a limited top contact area |
Chih-Chao Yang, Baozhen Li, Koichi Motoyama |
2022-02-01 |
| 11223008 |
Pillar-based memory hardmask smoothing and stress reduction |
Michael Rizzolo, Ashim Dutta, Dominik Metzler |
2022-01-11 |
| 11217742 |
Bottom electrode for semiconductor memory device |
Chih-Chao Yang, Daniel C. Edelstein |
2022-01-04 |