Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11527421 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Adib Khan, Ellie Yieh | 2022-12-13 |
| 11495470 | Method of enhancing etching selectivity using a pulsed plasma | Hailong Zhou, Kenji Takeshita, Rajinder Dhindsa, Taehwan Lee, Iljo Kwak | 2022-11-08 |
| 11373877 | Methods and apparatus for in-situ protection liners for high aspect ratio reactive ion etching | Daisuke Shimizu, Taiki Hatakeyama, Shinichi Koseki, Jairaj Payyapilly, Hikaru Watanabe | 2022-06-28 |