| 11205978 |
Handling and processing double-sided devices on fragile substrates |
Wayne MCMILLAN, Joseph C. Olson, Ludovic Godet, Rutger Meyer Timmerman Thijssen, Naamah ARGAMAN |
2021-12-21 |
| 11180849 |
Direct liquid injection system for thin film deposition |
Subramanya P. HERLE, Vicente Lim, Basavaraj Pattanshetty, Ajay Balaram MORE, Marco Mohr +2 more |
2021-11-23 |
| 11180851 |
Rotary reactor for uniform particle coating with thin films |
Colin C. Neikirk, Pravin K. Narwankar, Kaushal Gangakhedkar, Jonathan Frankel, David Masayuki Ishikawa +2 more |
2021-11-23 |
| 11174552 |
Rotary reactor for uniform particle coating with thin films |
Colin C. Neikirk, Pravin K. Narwankar, Kaushal Gangakhedkar, Jonathan Frankel, David Masayuki Ishikawa +2 more |
2021-11-16 |
| 11111600 |
Process chamber with resistive heating |
Tirunelveli S. Ravi |
2021-09-07 |
| 11041253 |
Silicon wafers by epitaxial deposition |
Tirunelveli S. Ravi, Andrzej Kaszuba, Quoc Truong, Jean R. Vatus |
2021-06-22 |
| 10961621 |
CVD reactor chamber with resistive heating and substrate holder |
Tirunelveli S. Ravi, Timothy N. Kleiner, Quoc Truong |
2021-03-30 |
| 10947640 |
CVD reactor chamber with resistive heating for silicon carbide deposition |
Tirunelveli S. Ravi |
2021-03-16 |
