Issued Patents 2020
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10781519 | Method and apparatus for processing substrate | — | 2020-09-22 |
| 10777425 | Method of processing substrate | Toru Hisamatsu, Sho Kumakura, Ryuichi Asako, Shinya Ishikawa, Masanobu Honda | 2020-09-15 |
| 10755944 | Etching method and plasma processing apparatus | Sho Kumakura | 2020-08-25 |
| 10748766 | Workpiece processing method | — | 2020-08-18 |
| 10707100 | Processing method and plasma processing apparatus | Toru Hisamatsu | 2020-07-07 |
| 10672605 | Film forming method | Sho Kumakura | 2020-06-02 |
| 10600660 | Method of selectively etching first region made of silicon nitride against second region made of silicon oxide | Sho Kumakura | 2020-03-24 |
| 10559472 | Workpiece processing method | Toru Hisamatsu, Yoshihide Kihara | 2020-02-11 |
| 10553446 | Method of processing target object | Yoshihide Kihara, Toru Hisamatsu | 2020-02-04 |
| 10541147 | Etching method | Takayuki Katsunuma, Masanobu Honda | 2020-01-21 |