Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10777425 | Method of processing substrate | Masahiro Tabata, Toru Hisamatsu, Ryuichi Asako, Shinya Ishikawa, Masanobu Honda | 2020-09-15 |
| 10755944 | Etching method and plasma processing apparatus | Masahiro Tabata | 2020-08-25 |
| 10672605 | Film forming method | Masahiro Tabata | 2020-06-02 |
| 10600660 | Method of selectively etching first region made of silicon nitride against second region made of silicon oxide | Masahiro Tabata | 2020-03-24 |