Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10831108 | Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology | Tal Marciano, Barak Bringoltz, Evgeni Gurevich, Ido Adam, Ze'ev Lindenfeld +17 more | 2020-11-10 |
| 10699969 | Quick adjustment of metrology measurement parameters according to process variation | Einat Peled, Eran Amit, Alexander Svizher, Yuval Lamhot, Wei-Te Cheng | 2020-06-30 |