Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879041 | Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers | Zheng John Ye, Abdul Aziz Khaja, Amit Kumar BANSAL, Xing Lin, Jianhua Zhou +2 more | 2020-12-29 |
| 10734232 | Deposition of metal silicide layers on substrates and chamber components | Prashant Kumar Kulshreshtha, Jiarui Wang, Milind Gadre, Xiaoquan Min, Paul Connors | 2020-08-04 |
| 10727059 | Highly etch selective amorphous carbon film | Sarah Michelle Bobek, Prashant Kumar Kulshreshtha, Rajesh Prasad, Harry Whitesell, Hidetaka Oshio +2 more | 2020-07-28 |
| 10679830 | Cleaning process for removing boron-carbon residuals in processing chamber at high temperature | Feng Bi, Prashant Kumar Kulshreshtha, Paul Connors | 2020-06-09 |
| 10636684 | Loadlock integrated bevel etcher system | Saptarshi Basu, Jeongmin Lee, Paul Connors, Dale R. Du Bois, Prashant Kumar Kulshreshtha +12 more | 2020-04-28 |
| 10580623 | Plasma processing using multiple radio frequency power feeds for improved uniformity | Zheng John Ye, Ganesh Balasubramanian, Thuy Britcher, Jay D. Pinson, II, Hiroji Hanawa +4 more | 2020-03-03 |