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Self-aligned gate isolation with asymmetric cut placement |
Ruilong Xie, Kangguo Cheng, Veeraraghavan S. Basker |
2020-11-10 |
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Kangguo Cheng, Junli Wang, Lawrence A. Clevenger, John H. Zhang |
2020-08-04 |
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Self-aligned via interconnect structures |
Benjamin C. Backes, Brian Alexander Cohen, Joyeeta Nag |
2020-07-28 |
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Ramachandra Divakaruni, Arvind Kumar |
2020-07-07 |
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Overturned thin film device with self-aligned gate and source/drain (S/D) contacts |
Lawrence A. Clevenger, Yiheng Xu, John H. Zhang |
2020-06-30 |
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Advanced interconnect with air gap |
John H. Zhang, Yann Mignot, Lawrence A. Clevenger, Richard S. Wise, Yiheng Xu +2 more |
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Structure for reduced source and drain contact to gate stack capacitance |
Richard Q. Williams |
2020-01-28 |