Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504744 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, John Holland +2 more | 2019-12-10 |
| 10304662 | Multi regime plasma wafer processing to increase directionality of ions | Alexei Marakhtanov, Lin Zhao, Kenneth Lucchesi, Zhigang Chen, John Holland | 2019-05-28 |
| 10283330 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Alexei Marakhtanov, Michael C. Kellogg, John Holland, Zhigang Chen, Kenneth Lucchesi +1 more | 2019-05-07 |