Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522644 | Different upper and lower spacers for contact | Guowei Xu, Hui Zang, Haiting Wang | 2019-12-31 |
| 10475890 | Scaled memory structures or other logic devices with middle of the line cuts | Haiting Wang, Wei Zhao, Hui Zang, Hong Yu, Zhenyu Hu +3 more | 2019-11-12 |
| 10403742 | Field-effect transistors with fins formed by a damascene-like process | Wei Zhao, Haiting Wang, David Paul Brunco, Jiehui Shu, Shesh Mani Pandey +1 more | 2019-09-03 |
| 10373877 | Methods of forming source/drain contact structures on integrated circuit products | Haiting Wang, Hong Yu, Hui Zang, Wei Zhao, Yue Zhong +3 more | 2019-08-06 |
| 10361289 | Gate oxide formation through hybrid methods of thermal and deposition processes and method for producing the same | Wei Zhao, Shahab Siddiqui, Haiting Wang, Ting-Hsiang Hung, Yiheng Xu +4 more | 2019-07-23 |
| 10326002 | Self-aligned gate contact and cross-coupling contact formation | Hui Zang, Ruilong Xie, Zhenyu Hu | 2019-06-18 |