GL

Guido Limbach

CG Carl Zeiss Smt Gmbh: 2 patents #30 of 205Top 15%
AB Asml Netherlands B.V.: 1 patents #281 of 721Top 40%
Overall (2019): #169,964 of 560,194Top 35%
2
Patents 2019

Issued Patents 2019

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10317802 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2019-06-11
10203607 Optical element unit for exposure processes Tilman Schwertner, Ulrich Bingel, Julian Kaller, Hans-Juergen Scherle, Jens Kugler +2 more 2019-02-12