| 10115564 |
Uniformity control circuit for use within an impedance matching circuit |
Alexei Marakhtanov, Kenneth Lucchesi, John Holland |
2018-10-30 |
| 10115568 |
Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring |
Michael C. Kellogg, Alexei Marakhtanov, John Holland, Zhigang Chen, Kenneth Lucchesi |
2018-10-30 |
| 10083853 |
Electrostatic chuck design for cooling-gas light-up prevention |
Alexander Matyushkin, Alexei Marakhtanov, John Holland, Keith Gaff |
2018-09-25 |
| 10002746 |
Multi regime plasma wafer processing to increase directionality of ions |
Alexei Marakhtanov, Lin Zhao, Kenneth Lucchesi, Zhigang Chen, John Holland |
2018-06-19 |
| 9984859 |
Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes |
Alexei Marakhtanov, John Holland, Brett Jacobs |
2018-05-29 |
