| 10128160 |
Systems and methods for detection of plasma instability by electrical measurement |
Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Ramesh Chandrasekharan +1 more |
2018-11-13 |
| 10121708 |
Systems and methods for detection of plasma instability by optical diagnosis |
Yukinori Sakiyama, Douglas Keil |
2018-11-06 |
| 10081869 |
Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates |
Christopher Ramsayer, Akhil Singhal, Kareem Boumatar |
2018-09-25 |
| 10077497 |
Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate |
Jeremy Tucker |
2018-09-18 |
| 9997422 |
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability |
Ishtak Karim, Yukinori Sakiyama, Yaswanth Rangineni, Douglas Keil, Ramesh Chandrasekharan +2 more |
2018-06-12 |
| 9953887 |
Measuring individual layer thickness during multi-layer deposition semiconductor processing |
Boaz Kenane |
2018-04-24 |
| 9941113 |
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication |
Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama +2 more |
2018-04-10 |
| 9875883 |
Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching |
Yukinori Sakiyama, Yaswanth Rangineni, Jeremy Tucker, Douglas Keil, Sunil Kapoor |
2018-01-23 |
