Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10043655 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram +3 more | 2018-08-07 |
| 10020188 | Method for depositing ALD films using halide-based precursors | James S. Sims, Jon Henri, Ramesh Chandrasekharan, Seshasayee Varadarajan, Kathryn M. Kelchner | 2018-07-10 |