Issued Patents 2018
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10164060 | Work function metal fill for replacement gate fin field effect transistor process | Hong He, Junli Wang, Yongan Xu | 2018-12-25 |
| 10147803 | Work function metal fill for replacement gate fin field effect transistor process | Hong He, Junli Wang, Yongan Xu | 2018-12-04 |
| 10141428 | Fin formation in fin field effect transistors | Kangguo Cheng, Bruce B. Doris, Hong He, Ali Khakifirooz | 2018-11-27 |
| 10037944 | Self-aligned contact process enabled by low temperature | Hong He, Chiahsun Tseng, Chun-Chen Yeh | 2018-07-31 |
| 10020303 | Methods for forming FinFETs having epitaxial Si S/D extensions with flat top surfaces on a SiGe seed layer | Hong He, Shogo Mochizuki, Chiahsun Tseng, Chun-Chen Yeh | 2018-07-10 |
| 9997367 | Non-lithographic line pattern formation | Chiahsun Tseng, David V. Horak, Chun-Chen Yeh | 2018-06-12 |
| 9991258 | FinFETs with non-merged epitaxial S/D extensions having a SiGe seed layer on insulator | Hong He, Shogo Mochizuki, Chiahsun Tseng, Chun-Chen Yeh | 2018-06-05 |
| 9991255 | FinFETs with non-merged epitaxial S/D extensions on a seed layer and having flat top surfaces | Hong He, Shogo Mochizuki, Chiahsun Tseng, Chun-Chen Yeh | 2018-06-05 |
| 9985030 | FinFET semiconductor device having integrated SiGe fin | Kangguo Cheng, Hong He, Ali Khakifirooz, Chiahsun Tseng, Chun-Chen Yeh | 2018-05-29 |
| 9953916 | Critical dimension shrink through selective metal growth on metal hardmask sidewalls | Hsueh-Chung Chen, Hong He, Juntao Li, Chih-Chao Yang | 2018-04-24 |