Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9829800 | System correction from long timescales | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Boris Bittner, Norbert Wabra, Sonja Schneider | 2017-11-14 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Norbert Wabra, Boris Bittner, Hartmut Enkisch, Stephan Muellender, Olaf Conradi | 2017-03-28 |