Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9846367 | Projection exposure apparatus with at least one manipulator | Boris Bittner, Martin von Hodenberg | 2017-12-19 |
| 9829800 | System correction from long timescales | Boris Bittner, Martin von Hodenberg, Sonja Schneider, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Boris Bittner, Martin von Hodenberg, Sonja Schneider | 2017-11-14 |
| 9709770 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Boris Bittner, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner, Rumen Iliew +1 more | 2017-07-18 |
| 9606446 | Reflective optical element for EUV lithography and method of manufacturing a reflective optical element | Boris Bittner, Martin von Hodenberg, Hartmut Enkisch, Stephan Muellender, Olaf Conradi | 2017-03-28 |
| 9588445 | Projection objective for a microlithographic projection exposure apparatus | Robert Eder | 2017-03-07 |