Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9829800 | System correction from long timescales | Boris Bittner, Norbert Wabra, Martin von Hodenberg, Ricarda Schoemer, Ruediger Mack | 2017-11-28 |
| 9817316 | Projection exposure method and projection exposure apparatus for microlithography | Boris Bittner, Norbert Wabra, Martin von Hodenberg | 2017-11-14 |
| 9709770 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Boris Bittner, Norbert Wabra, Ricarda Schoemer, Hendrik Wagner, Rumen Iliew +1 more | 2017-07-18 |