| 9793163 |
Subtractive self-aligned via and plug patterning for back end of line (BEOL) interconnects |
Robert L. Bristol, Florian Gstrein, Richard E. Schenker, Paul A. Nyhus, Hui Jae Yoo |
2017-10-17 |
| 9793159 |
Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects |
Paul A. Nyhus, Elliot N. Tan, Swaminathan Sivakumar |
2017-10-17 |
| 9716037 |
Gate aligned contact and method to fabricate same |
Oleg Golonzka, Swaminathan Sivakumar, Tahir Ghani |
2017-07-25 |
| 9679845 |
Necked interconnect fuse structure for integrated circuits |
Zhanping Chen, Andrew W. Yeoh, Seongtae Jeong, Uddalak Bhattacharya |
2017-06-13 |
| 9666451 |
Self-aligned via and plug patterning for back end of line (BEOL) interconnects |
Paul A. Nyhus |
2017-05-30 |
| 9666442 |
Methods for single exposure—self-aligned double, triple, and quadruple patterning |
Fitih M. Cinnor |
2017-05-30 |
| 9558947 |
Pattern decomposition lithography techniques |
Hossam M. Abdallah, Elliot N. Tan, Swaminathan Sivakumar, Oleg Golonzka, Robert M. Bigwood |
2017-01-31 |