Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9793159 | Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects | Charles H. Wallace, Paul A. Nyhus, Elliot N. Tan | 2017-10-17 |
| 9716037 | Gate aligned contact and method to fabricate same | Oleg Golonzka, Charles H. Wallace, Tahir Ghani | 2017-07-25 |
| 9653576 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Paul A. Nyhus | 2017-05-16 |
| 9625815 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Paul A. Nyhus, Eungnak Han, Ernisse Putna | 2017-04-18 |