EH

Eungnak Han

IN Intel: 2 patents #1,256 of 5,604Top 25%
Overall (2017): #154,674 of 506,227Top 35%
2
Patents 2017

Issued Patents 2017

Patent #TitleCo-InventorsDate
9625815 Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging Paul A. Nyhus, Swaminathan Sivakumar, Ernisse Putna 2017-04-18
9570349 Non-lithographically patterned directed self assembly alignment promotion layers Robert L. Bristol, Rami Hourani, James M. Blackwell 2017-02-14