HW

Holger Walter

CG Carl Zeiss Smt Gmbh: 3 patents #31 of 237Top 15%
AB Asml Netherlands B.V.: 1 patents #199 of 568Top 40%
Overall (2017): #76,545 of 506,227Top 20%
3
Patents 2017

Issued Patents 2017

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
9760019 Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus Boris Bittner 2017-09-12
9746778 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2017-08-29
9720336 Microlithographic apparatus and method of varying a light irradiance distribution Alexander Wolf 2017-08-01