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Apparatus and method for measurement of the thermal performance of an electrostatic wafer chuck |
Vijay D. Parkhe, Michael R. Rice |
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Substrate temperature control apparatus including optical fiber heating, substrate temperature control systems, electronic device processing systems, and methods |
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Electrostatic chuck with external flow adjustments for improved temperature distribution |
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Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods |
Wendell Glenn Boyd, Jr., Vijay D. Parkhe, Konstantin Makhratchev, Masanori Ono, Senh Thach |
2017-01-31 |
