| 9530621 |
Integrated induction coil and microwave antenna as an all-planar source |
Peter L. G. Ventzek |
2016-12-27 |
| 9520275 |
Mono-energetic neutral beam activated chemical processing system and method of using |
— |
2016-12-13 |
| 9455133 |
Hollow cathode device and method for using the device to control the uniformity of a plasma process |
Kazuki Denpoh, Peter L. G. Ventzek, Lin Xu |
2016-09-27 |
| 9431218 |
Scalable and uniformity controllable diffusion plasma source |
Jianping Zhao, Radha Sundararajan, Merritt Funk |
2016-08-30 |
| 9396955 |
Plasma tuning rods in microwave resonator processing systems |
Jianping Zhao, Merritt Funk, Iwao Toshihiko, Peter L. G. Ventzek |
2016-07-19 |
| 9396900 |
Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties |
Barton Lane, Peter L. G. Ventzek, Merritt Funk, Jianping Zhao, Radha Sundararajan |
2016-07-19 |
| 9301383 |
Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus |
Jianping Zhao, Merritt Funk, Radha Sundararajan |
2016-03-29 |
| 9290848 |
Anisotropic etch of copper using passivation |
Ying Zhang |
2016-03-22 |
| 9288890 |
Method and apparatus for providing an anisotropic and mono-energetic neutral beam by non-ambipolar electron plasma |
Merritt Funk, Zhiying Chen |
2016-03-15 |