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Methods of forming self-aligned contact structures on semiconductor devices and the resulting devices |
Ruilong Xie, Chanro Park, Min Gyu Sung, Hoon Kim |
2016-11-22 |
| 9490317 |
Gate contact structure having gate contact layer |
Ryan Ryoung-Han Kim |
2016-11-08 |
| 9478662 |
Gate and source/drain contact structures for a semiconductor device |
Ruilong Xie |
2016-10-25 |
| 9460963 |
Self-aligned contacts and methods of fabrication |
Gabriel Padron Wells, Xiang Hu, Guillaume Bouche |
2016-10-04 |
| 9455254 |
Methods of forming a combined gate and source/drain contact structure and the resulting device |
Ruilong Xie, Su Chen Fan, Balasubramanian S. Pranatharthi Haran |
2016-09-27 |
| 9397049 |
Gate tie-down enablement with inner spacer |
Su Chen Fan, Lars Liebmann, Sanjay C. Mehta |
2016-07-19 |
| 9324656 |
Methods of forming contacts on semiconductor devices and the resulting devices |
Ruilong Xie |
2016-04-26 |