RK

Ryan Ryoung-Han Kim

Globalfoundries: 14 patents #38 of 2,145Top 2%
NA Naver: 1 patents #2 of 39Top 6%
📍 Albany, NY: #1 of 137 inventorsTop 1%
🗺 New York: #136 of 11,723 inventorsTop 2%
Overall (2016): #2,667 of 481,213Top 1%
15
Patents 2016

Issued Patents 2016

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
9490317 Gate contact structure having gate contact layer Andre P. Labonte 2016-11-08
9484258 Method for producing self-aligned vias Wenhui Wang, Lei Sun, Erik Verduijn, Yulu Chen 2016-11-01
9478462 SAV using selective SAQP/SADP Wenhui Wang, Lei Sun, Erik Verduijn, Yulu Chen 2016-10-25
9466604 Metal segments as landing pads and local interconnects in an IC device Youngtag Woo, Myungjun Lee, Jongwook Kye 2016-10-11
9460079 Method, system and recording medium for providing dictionary function and file distribution system Tae Hoon Lee, Jonghwan Kim, Eunjoo Jeon, Jin An JUNG, Taihwa Hong +2 more 2016-10-04
9449835 Methods of forming features having differing pitch spacing and critical dimensions Linus Jang 2016-09-20
9431264 Methods of forming integrated circuits and multiple critical dimension self-aligned double patterning processes Linus Jang, Young-joon Moon 2016-08-30
9412616 Methods of forming single and double diffusion breaks on integrated circuit products comprised of FinFET devices and the resulting products Ruilong Xie, Kwan-Yong Lim, Min Gyu Sung 2016-08-09
9406616 Merged source/drain and gate contacts in SRAM bitcell Youngtag Woo 2016-08-02
9379027 Method of utilizing trench silicide in a gate cross-couple construct 2016-06-28
9362403 Buried fin contact structures on FinFET semiconductor devices Ruilong Xie, William J. Taylor, Jr. 2016-06-07
9362279 Contact formation for semiconductor device Ruilong Xie, Andy Wei, William J. Taylor, Jr., Kwan-Yong Lim, Chanro Park 2016-06-07
9362181 Methods of forming diffusion breaks on integrated circuit products comprised of FinFET devices and the resulting products Ruilong Xie, Min Gyu Sung, Kwan-Yong Lim, Chanro Park 2016-06-07
9299781 Semiconductor devices with contact structures and a gate structure positioned in trenches formed in a layer of material Ruilong Xie, William J. Taylor, Jr. 2016-03-29
9275889 Method and apparatus for high yield contact integration scheme Jason R. Cantone, Wenhui Wang 2016-03-01