JF

Juergen Fischer

CG Carl Zeiss Smt Gmbh: 3 patents #27 of 219Top 15%
AB Asml Netherlands B.V.: 1 patents #204 of 517Top 40%
📍 Heidenheim, MN: #1 of 2 inventorsTop 50%
Overall (2016): #67,267 of 481,213Top 15%
3
Patents 2016

Issued Patents 2016

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
9513562 Projection exposure apparatus for microlithography for the production of semiconductor components Armin Schoeppach, Matthias Orth, Norbert Muehlberger, Thorsten Rassel, Armin Werber +1 more 2016-12-06
9341807 Gravitation compensation for optical elements in projection exposure apparatuses Norbert Muehlberger, Thorsten Rassel, Armin Schoeppach, Matthias Orth 2016-05-17
9304404 Arrangement for actuating an element in a microlithographic projection exposure apparatus Ulrich Schoenhoff, Bernhard Geuppert, Hans Butler, Robertus Johannes Marinus De Jongh 2016-04-05