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Gas distribution apparatus for directional and proportional delivery of process gas to a process chamber |
Roy C. Nangoy |
2016-11-08 |
| 9305810 |
Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery |
Roy C. Nangoy |
2016-04-05 |
| 9287093 |
Dynamic ion radical sieve and ion radical aperture for an inductively coupled plasma (ICP) reactor |
Graeme Scott, Ajay Kumar |
2016-03-15 |
| 9263308 |
Water soluble mask for substrate dicing by laser and plasma etch |
Wei-Sheng Lei, Madhava Rao Yalamanchili, Brad Eaton, Ajay Kumar |
2016-02-16 |
| 9245802 |
Wafer dicing using femtosecond-based laser and plasma etch |
Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden |
2016-01-26 |
| 9236305 |
Wafer dicing with etch chamber shield ring for film frame wafer applications |
Wei-Sheng Lei, Jivko Dinev, Aparna Iyer, Brad Eaton, Ajay Kumar |
2016-01-12 |