Issued Patents 2011
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8034213 | Plasma processing apparatus and plasma processing method | Yoshinobu Hayakawa, Hidetoshi Hanaoka, Noriaki Kodama, Chishio Koshimizu, Manabu Iwata +1 more | 2011-10-11 |
| D645486 | Dielectric window for plasma processing device | Wataru Yoshikawa, Jun Yoshikawa | 2011-09-20 |
| 8013626 | Test apparatus and driver circuit | Yasuhiro Urabe, Yuji Kuwana | 2011-09-06 |
| 8012882 | Method of manufacturing nitride substrate for semiconductors | — | 2011-09-06 |
| 8008165 | Nitride semiconductor wafer and method of processing nitride semiconductor wafer | Masahiro Nakayama, Koshi Tamamura, Masao Ikeda | 2011-08-30 |
| 7993489 | Capacitive coupling plasma processing apparatus and method for using the same | Chishio Koshimizu, Akira Koshiishi | 2011-08-09 |
| 7990177 | Driver circuit for producing signal simulating transmission loss | Takashi Sekino, Takayuki Nakamura | 2011-08-02 |
| 7988816 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +11 more | 2011-08-02 |
| 7960284 | III-V compound semiconductor substrate manufacturing method | Akihiro Hachigo, Takayuki Nishiura | 2011-06-14 |
| 7951262 | Plasma processing apparatus and method | Akira Koshiishi, Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu +10 more | 2011-05-31 |
| 7919343 | Group III nitride crystal and method for surface treatment thereof, group III nitride stack and manufacturing method thereof, and group III nitride semiconductor device and manufacturing method thereof | Keiji Ishibashi, Masato Irikura | 2011-04-05 |
| 7872331 | Nitride semiconductor wafer | Keiji Ishibashi, Hidenori Mikami | 2011-01-18 |