Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8075728 | Gas flow equalizer plate suitable for use in a substrate process chamber | Ajit Balakrishna, Shahid Rauf, Andrew Nguyen, Michael D. Willwerth | 2011-12-13 |
| 8066895 | Method to control uniformity using tri-zone showerhead | Rodolfo P. Belen, Edward P. Hammond, IV, Brian K. Hatcher, Dan Katz, Alexander Paterson | 2011-11-29 |
| 8017526 | Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process | Edward P. Hammond, IV, Rodolfo P. Belen, Alexander Paterson, Brian K. Hatcher, Dan Katz | 2011-09-13 |
| 7967996 | Process for wafer backside polymer removal and wafer front side photoresist removal | Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Shahid Rauf, Ajit Balakrishna +6 more | 2011-06-28 |
| 7879250 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Michael D. Willwerth, Alexander Paterson | 2011-02-01 |