Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8075728 | Gas flow equalizer plate suitable for use in a substrate process chamber | Ajit Balakrishna, Shahid Rauf, Andrew Nguyen, Valentin N. Todorow | 2011-12-13 |
| 7879250 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Valentin N. Todorow, Alexander Paterson | 2011-02-01 |