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Jennifer Y. Sun

Applied Materials: 10 patents #12 of 828Top 2%
📍 Fremont, CA: #18 of 1,263 inventorsTop 2%
🗺 California: #389 of 41,698 inventorsTop 1%
Overall (2011): #2,888 of 364,097Top 1%
11
Patents 2011

Issued Patents 2011

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
8080479 Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-12-20
8076247 Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-12-13
8067067 Clean, dense yttrium oxide coating protecting semiconductor processing apparatus Senh Thach, Jim Dempster, Li Xu 2011-11-29
8034734 Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins 2011-10-11
8016948 Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal Xikun Wang, Li Xu 2011-09-13
7968469 Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-06-28
7942965 Method of fabricating plasma reactor parts Elmira Ryabova, Jie Yuan 2011-05-17
7925703 Graphical interactive interface for immersive online communities Mark Dinan, Ann Pickard, James Mason Bower 2011-04-12
7919722 Method for fabricating plasma reactor parts Elmira Ryabova, Jie Yuan 2011-04-05
7884025 Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-02-08
7879731 Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more 2011-02-01