Issued Patents 2011
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8039338 | Method for reducing defects of gate of CMOS devices during cleaning processes by modifying a parasitic PN junction | Peter Javorka, Karsten Wieczorek, Kerstin Ruttloff | 2011-10-18 |
| 8039335 | Semiconductor device comprising NMOS and PMOS transistors with embedded Si/Ge material for creating tensile and compressive strain | Sven Beyer, Patrick Press, Wolfgang Buchholtz | 2011-10-18 |
| 7999326 | Tensile strain source using silicon/germanium in globally strained silicon | Andy Wei, Karla Romero | 2011-08-16 |
| 7955937 | Method for manufacturing semiconductor device comprising SOI transistors and bulk transistors | Karsten Wieczorek, Thomas Feudel, Thomas J. Heller, Jr. | 2011-06-07 |
| 7906383 | Stress transfer in an interlayer dielectric by providing a stressed dielectric layer above a stress-neutral dielectric material in a semiconductor device | Ralf Richter, Andy Wei, Joerg Hohage | 2011-03-15 |
| 7893503 | Semiconductor device comprising NMOS and PMOS transistors with embedded Si/Ge material for creating tensile and compressive strain | Sven Beyer, Patrick Press, Wolfgang Buchholtz | 2011-02-22 |
| 7863171 | SOI transistor having a reduced body potential and a method of forming the same | Jan Hoentschel, Andy Wei, Joe Bloomquist | 2011-01-04 |