Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6979256 | Retaining ring with wear pad for use in chemical mechanical planarization | Paul Fathauer, Angela Mroczek-Petroski, David Perry, James Macey | 2005-12-27 |
| 6964601 | Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers | Angela Petroski, Paul Fathauer, David Perry, James Macey | 2005-11-15 |
| 6899610 | Retaining ring with wear pad for use in chemical mechanical planarization | Paul Fathauer, Angela Mroczek-Petroski, David Perry, James Macey | 2005-05-31 |
| 6863774 | Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same | Paul Fathauer, Angela Mroczek-Petroski, David Perry, James J. Petroski | 2005-03-08 |
| 6852020 | Polishing pad for use in chemical—mechanical planarization of semiconductor wafers and method of making same | Angela Petroski, Paul Fathauer, Marc A. Yesnik | 2005-02-08 |