Issued Patents 2005
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6979256 | Retaining ring with wear pad for use in chemical mechanical planarization | Richard D. Cooper, Angela Mroczek-Petroski, David Perry, James Macey | 2005-12-27 |
| 6964601 | Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers | Angela Petroski, Richard D. Cooper, David Perry, James Macey | 2005-11-15 |
| 6945846 | Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making | Angela Petroski, Richard D. Copper, David Perry | 2005-09-20 |
| 6899610 | Retaining ring with wear pad for use in chemical mechanical planarization | Richard D. Cooper, Angela Mroczek-Petroski, David Perry, James Macey | 2005-05-31 |
| 6875077 | Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making | Angela Petroski, Richard D. Copper, David Perry | 2005-04-05 |
| 6863774 | Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same | Richard D. Cooper, Angela Mroczek-Petroski, David Perry, James J. Petroski | 2005-03-08 |
| 6852020 | Polishing pad for use in chemical—mechanical planarization of semiconductor wafers and method of making same | Angela Petroski, Richard D. Cooper, Marc A. Yesnik | 2005-02-08 |