TO

Tamotsu Owada

Fujitsu Limited: 3 patents #166 of 2,894Top 6%
Overall (2005): #16,100 of 245,428Top 7%
3
Patents 2005

Issued Patents 2005

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
6958525 Low dielectric constant film material, film and semiconductor device using such material Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Iwao Sugiura 2005-10-25
6949830 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device Shun-ichi Fukuyama, Hirofumi Watatani, Kengo Inoue, Atsuo Shimizu 2005-09-27
6943431 Semiconductor device using low-k material as interlayer insulating film and including a surface modifying layer Shun-ichi Fukuyama, Hiroko Inoue, Ken Sugimoto 2005-09-13