Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6927162 | Method of forming a contact in a semiconductor device with formation of silicide prior to plasma treatment | Wen Yu, Connie P. Wang, Paul R. Besser, Keizaburo Yoshie | 2005-08-09 |
| 6893910 | One step deposition method for high-k dielectric and metal gate electrode | Christy Mei-Chu Woo, Paul R. Besser, Minh Van Ngo, James Pan | 2005-05-17 |
| 6861350 | Method of manufacturing semiconductor device comprising silicon-rich tasin metal gate electrode | Minh Van Ngo, Christy Mei-Chu Woo, James Pan, Paul R. Besser | 2005-03-01 |