Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800142 | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment | Adrianne K. Tipton, Souvik Banerjee, Raashina Humayun, Patrick Joyce | 2004-10-05 |
| 6764552 | Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials | Patrick Joyce, Adrianne K. Tipton, Dennis W. Hess, Satyanarayana Myneni, Galit Levitin | 2004-07-20 |