Issued Patents 2004
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800142 | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment | Adrianne K. Tipton, Krishnan Shrinivasan, Raashina Humayun, Patrick Joyce | 2004-10-05 |