Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800142 | Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment | Krishnan Shrinivasan, Souvik Banerjee, Raashina Humayun, Patrick Joyce | 2004-10-05 |
| 6764552 | Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials | Patrick Joyce, Krishnan Shrinivasan, Dennis W. Hess, Satyanarayana Myneni, Galit Levitin | 2004-07-20 |
| 6715498 | Method and apparatus for radiation enhanced supercritical fluid processing | Raashina Humayun, Patrick Joyce, Vishal Gauri | 2004-04-06 |