Issued Patents 2004
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Christoph Hohle, Jörg Rottstegge, Christian Eschbaumer | 2004-10-19 |
| 6800407 | Method for experimentally verifying imaging errors in photomasks | Gunther Czech, Ernst-Christian Richter, Ulrich Scheler | 2004-10-05 |
| 6770423 | Negative resist process with simultaneous development and silylation | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Jörg Rottstegge, Christian Eschbaumer, Christoph Hohle, Waltraud Herbst | 2004-07-06 |
| 6746827 | Process for structuring a photoresist layer | Ernst-Christian Richter | 2004-06-08 |
| 6746821 | Method of structuring a photoresist layer | Ernst-Christian Richter | 2004-06-08 |
| 6746828 | Process for structuring a photoresist layer | Ernst-Christian Richter | 2004-06-08 |
| 6743572 | Method for structuring a photoresist layer | Ernst-Christian Richter | 2004-06-01 |
| 6740475 | Method for structuring a photoresist layer | Ernst-Christian Richter | 2004-05-25 |
| 6703190 | Method for producing resist structures | Klaus Elian, Stefan Hien, Ernst-Christian Richter | 2004-03-09 |
| 6696208 | Method for experimentally verifying imaging errors in optical exposure units | Gunther Czech, Ernst-Christian Richter, Ulrich Scheler | 2004-02-24 |