Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835528 | Fluorine-containing photoresist having reactive anchors for chemical amplification and improved copolymerization properties | — | 2004-12-28 |
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Christoph Hohle, Christian Eschbaumer, Michael Sebald | 2004-10-19 |
| 6770423 | Negative resist process with simultaneous development and silylation | Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Christoph Hohle, Gertrud Falk +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Christian Eschbaumer, Christoph Hohle, Waltraud Herbst, Michael Sebald | 2004-07-06 |