Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6806027 | CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTITUENTS USING TRANSPARENCY ENHANCEMENT OF RESIST COPOLYMERS FOR 157 NM PHOTOLITHOGRAPHY THROUGH THE USE OF FLUORINATED CINNAMIC ACID DERIVATIVES | Jörg Rottstegge, Christian Eschbaumer, Michael Sebald | 2004-10-19 |
| 6770423 | Negative resist process with simultaneous development and silylation | Jörg Rottstegge, Eberhard Kuhn, Waltraud Herbst, Christian Eschbaumer, Gertrud Falk +1 more | 2004-08-03 |
| 6759184 | Amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers | Jörg Rottstegge, Christian Eschbaumer, Waltraud Herbst, Michael Sebald | 2004-07-06 |