Issued Patents 2004
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835983 | Silicon-on-insulator (SOI) integrated circuit (IC) chip with the silicon layers consisting of regions of different thickness | Tak H. Ning | 2004-12-28 |
| 6825102 | Method of improving the quality of defective semiconductor material | Stephen W. Bedell, Keith E. Fogel, Shreesh Narasimha | 2004-11-30 |
| 6812114 | Patterned SOI by formation and annihilation of buried oxide regions during processing | Tze-Chiang Chen | 2004-11-02 |
| 6805962 | Method of creating high-quality relaxed SiGe-on-insulator for strained Si CMOS applications | Stephen W. Bedell, Jack O. Chu, Keith E. Fogel, Steven J. Koester, John A. Ott | 2004-10-19 |
| 6803240 | Method of measuring crystal defects in thin Si/SiGe bilayers | Stephen W. Bedell, Keith E. Fogel | 2004-10-12 |
| 6800518 | Formation of patterned silicon-on-insulator (SOI)/silicon-on-nothing (SON) composite structure by porous Si engineering | Robert E. Bendernagel, Kwang Su Choe, Bijan Davari, Keith E. Fogel, Ghavam G. Shahidi +1 more | 2004-10-05 |
| 6784072 | Control of buried oxide in SIMOX | Stephen Fox, Neena Garg, Kenneth J. Giewont, Junedong Lee, Siegfried Maurer +2 more | 2004-08-31 |
| 6756639 | Control of buried oxide quality in low dose SIMOX | Maurice Heathcote Norcott | 2004-06-29 |
| 6756257 | Patterned SOI regions on semiconductor chips | Bijan Davari, Ghavam G. Shahidi, Sandip Tiwari | 2004-06-29 |
| 6743651 | Method of forming a SiGe-on-insulator substrate using separation by implantation of oxygen | Jack O. Chu, Feng-Yi Huang, Steven J. Koester | 2004-06-01 |
| 6717216 | SOI based field effect transistor having a compressive film in undercut area under the channel and a method of making the device | Bruce B. Doris, Dureseti Chidambarrao, Xavier Baie, Jack A. Mandelman, Dominic J. Schepis | 2004-04-06 |
| 6717217 | Ultimate SIMOX | Keith E. Fogel, Maurice Heathcote Norcott | 2004-04-06 |