Issued Patents 2004
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6836017 | Protection of low-k ILD during damascene processing with thin liner | Minh Van Ngo, Steven C. Avanzino, John Sanchez, Suzette K. Pangrle | 2004-12-28 |
| 6830998 | Gate dielectric quality for replacement metal gate transistors | James Pan, Paul R. Besser, Minh Van Ngo, Jinsong Yin | 2004-12-14 |
| 6806172 | Physical vapor deposition of nickel | Eric N. Paton, Susan Tover | 2004-10-19 |
| 6730587 | Titanium barrier for nickel silicidation of a gate electrode | Jacques Bertrand, Minh Van Ngo, George Jonathan Kluth | 2004-05-04 |
| 6727592 | Copper interconnect with improved barrier layer | John Sanchez, Darrell M. Erb, Amit P. Marathe | 2004-04-27 |
| 6727560 | Engineered metal gate electrode | James Pan, Paul R. Besser, Minh Van Ngo, Jinsong Yin | 2004-04-27 |
| 6724051 | Nickel silicide process using non-reactive spacer | Minh Van Ngo, George Jonathan Kluth | 2004-04-20 |
| 6723635 | Protection low-k ILD during damascene processing with thin liner | Minh Van Ngo, Steven C. Avanzino, John Sanchez, Suzette K. Pangrle | 2004-04-20 |
| 6720225 | Reactive pre-clean using reducing gas during nickel silicide process | Minh Van Ngo | 2004-04-13 |
| 6713392 | Nitrogen oxide plasma treatment for reduced nickel silicide bridging | Minh Van Ngo | 2004-03-30 |