SC

Simon Chooi

CM Chartered Semiconductor Manufacturing: 12 patents #1 of 163Top 1%
IM Institute Of Microelectronics: 1 patents #7 of 42Top 20%
📍 Singapore, SG: #2 of 744 inventorsTop 1%
Overall (2004): #693 of 270,089Top 1%
13
Patents 2004

Issued Patents 2004

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
6835989 Methods to form dual metal gates by incorporating metals and their conductive oxides Wenhe Lin, Mei Sheng Zhou, Kin Leong Pey 2004-12-28
6821888 Method of copper/copper surface bonding using a conducting polymer for application in IC chip bonding Yakub Aliyu, Meisheng Zhou, John Sudijono, Subhash Gupta, Sudipto Ranendra Roy 2004-11-23
6813796 Apparatus and methods to clean copper contamination on wafer edge Sudipto Ranendra Roy, Subhash Gupta, Xu Yi, Yakub Aliyu, Mei Sheng Zhou +2 more 2004-11-09
6797605 Method to improve adhesion of dielectric films in damascene interconnects Luona Goh, Siew Lok Toh, Tong Earn Tay 2004-09-28
6762085 Method of forming a high performance and low cost CMOS device Jia Zhen Zheng, Soh Yun Siah, Liang-Choo Hsia, Eng Hua Lim, Chew Hoe Ang 2004-07-13
6750519 Dual metal gate process: metals and their silicides Wenhe Lin, Mei Sheng Zhou, Kin Leong Pey 2004-06-15
6730591 Method of using silicon rich carbide as a barrier material for fluorinated materials Licheng M. Han, Xu Yi, Mei Sheng Zhou, Joseph Xie 2004-05-04
6720204 Method of using hydrogen plasma to pre-clean copper surfaces during Cu/Cu or Cu/metal bonding John Sudijono, Yakub Aliyu, Mei Sheng Zhou, Subhash Gupta, Sudipto Ranendra Roy +2 more 2004-04-13
6705512 Method of application of conductive cap-layer in flip-chip, cob, and micro metal bonding Kwok Keung Paul Ho, Yi Xu, Yakub Aliyu, Mei Sheng Zhou, John Sudijono +2 more 2004-03-16
6692579 Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence Sudipto Ranendra Roy, Yi Xu, Yakub Aliyu, Mei Sheng Zhou, John Sudijono +2 more 2004-02-17
6690091 Damascene structure with reduced capacitance using a boron carbon nitride passivation layer, etch stop layer, and/or cap layer Yi Xu, Mei Sheng Zhou 2004-02-10
6683002 Method to create a copper diffusion deterrent interface Yakub Aliyu, Mei Sheng Zhou, John Sudijono, Subhash Gupta, Sudipto Ranendra Roy +2 more 2004-01-27
6677652 Methods to form dual metal gates by incorporating metals and their conductive oxides Wenhe Lin, Mei Sheng Zhou, Kin Leong Pey 2004-01-13