Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6667486 | Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same | Hiroya Ohta, Norio Saitou, Haruo Yoda, Yoshikiyo Yui, Shin'ichi Hashimoto | 2003-12-23 |
| 6583431 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasuhiro Someda, Yoshinori Nakayama, Masahide Okumura, Hidetoshi Satoh | 2003-06-24 |
| 6573520 | Electron beam lithography system | Hidetoshi Satoh, Hiroshi Tsuji, Kunio Harada | 2003-06-03 |
| 6555833 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasuhiro Someda, Yoshinori Nakayama, Masahide Okumura, Hidetoshi Satoh | 2003-04-29 |
| 6511048 | Electron beam lithography apparatus and pattern forming method | Yasuhiro Someda, Hiroya Ohta, Takashi Matsuzaka, Norio Saitou, Yoshinori Nakayama | 2003-01-28 |
| 6509572 | Charged particle beam lithography apparatus for forming pattern on semi-conductor | Hiroyuki Ito, Yasuhiro Someda, Yoshinori Nakayama, Masahide Okumura, Hidetoshi Satoh | 2003-01-21 |